//log: EAM baseline design done.
#ifndef _POEMV1_INCLUDED
#define _POEMV1_INCLUDED

#include <mask.h>
#include <math.h>
#include <UCSB_markers.cc>

const int LSI=1;
const int LSI2=31;
const int LSI3=32;
const int LVC=2;
const int LPMESA=3;
//QW actually is the btm SCH layer
const int LQW=4;
const int LNMESA=5;
const int LNMTL=6;
const int LPMTL=7;
const int LIMPL=8;
const int LVIA=11;
const int LPROBE=12;
//virtual layer
const int LVIRTUAL=100; 

// constants
#define PI 3.1415926535897932

int taperOutID[]={
LSI,
LVC,
LPMESA,
LQW,
LNMESA,
LNMTL,
LPMTL,
LIMPL,
LVIA,
LPROBE,
};
//layer name for label.
const int taperOutLayers = sizeof(taperOutID)/sizeof(int);
char taperOutName[][10]={
"SI",
"VC",
"PMESA",
"QW",
"NMESA",
"NMETAL",
"PMETAL",
"IMPL",
"VIA",
"PROBE",
};

//N or P mask; N or P photoresist; Etch or Liftoff; Hole or Mesa
char taperOutPolarity[][30] = {
"N MASK/P PR/E/H",//LSi
"N MASK/P PR/E/H",//LVC
"P MASK/P PR/E/M",//LPMESA
"P MASK/P PR/E/M",//LQW
"P MASK/P PR/E/M",//LNMESA
"N MASK/P PR/L/M",//LNMTL
"N MASK/P PR/L/M",//LPMTL
"N MASK/P PR/E/H",//LIMPL
"N MASK/P PR/E/H",//LVIA
"N MASK/P PR/L/M",//LPROBE
};




/* layer definition
struct layer layers[] = {
{LSI , "Si Waveguide", AQUA, VISIBLE, EPS1}, 
{LSI2 , "Si Waveguide for conversion", AQUA, VISIBLE, EPS1}, 
{LVC , "Vertical Channel", BLACK, VISIBLE, EPS1}, 
{LPMESA , "P InP Mesa", BLUE, VISIBLE, EPS1}, 
{LQW, "QW/SCH Pattern",GREEN, VISIBLE, EPS1}, 
{LNMESA, "N InP Mesa",RED, VISIBLE, EPS1}, 
{LNMTL , "N Metal" ,DK_GREEN,VISIBLE, EPS1}, 
{LIMPL , "Implatation" ,PURPLE,VISIBLE, EPS1},
{LPMTL , "P Metal" ,ORANGE,VISIBLE, EPS1},
{LVIA , "Via" ,BROWN,VISIBLE, EPS1},
{LPROBE , "Probe" ,YELLOW,VISIBLE, EPS1},
{LVIRTUAL , "Virtual layer" ,CYAN,INVISIBLE, EPS1},
END_LAYERS
};
*/

#endif /* _POEMV1_INCLUDED */